Memory device with memory cell pillar having resistive memory layer with wedge memory portion and body memory portion, and method of fabricating the same

ABSTRACT

A memory device may include a first conductive line, a second conductive line extending in a direction intersecting the first conductive line, such that the first conductive line and the second conductive line vertically overlap at a cross-point between the first conductive line and the second conductive line, and a memory cell pillar at the cross-point. The memory cell pillar may include a heating electrode layer and a resistive memory layer contacting the heating electrode layer. The resistive memory layer may include a wedge memory portion having a width that increases continuously in proportion with increasing distance from the heating electrode layer, and a body memory portion connected to the wedge memory portion such that the body memory portion and the wedge memory portion comprise an individual and continuous layer, the body memory portion having a greater width than the wedge memory portion.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.15/867,951, filed on Jan. 11, 2018, which claims the benefit, under 35U.S.C. § 119, of Korean Patent Application No. 10-2017-0081387, filed onJun. 27, 2017, in the Korean Intellectual Property Office, thedisclosure of each of which is incorporated herein in its entirety byreference.

BACKGROUND

The inventive concepts relate to memory devices and methods offabricating the same, and more particularly, to memory devices having across-point array structure and methods of fabricating the same.

With the continuous trend of producing lighter, thinner, and smallerelectronics, there is increasing demand for increased integration ofsemiconductor devices. 3-dimensional (3D) cross-point stack-structuredmemory devices, in which a memory cell is arranged at a cross-pointbetween two electrodes crossing each other, are proposed asnext-generation non-volatile memory devices that may enable suchincreased integration. As the increased integration and down-scaling(“miniaturization”) of cross-point stack-structured memory devices arecontinuously required, reduction in sizes of components comprising amemory device is required, and thus, there is a need to develop astructure configured to minimize power consumption of a highlyintegrated memory device and improve the reliability thereof.

SUMMARY

The inventive concepts include a cross-point stack-structured memorydevice having a structure configured to minimize power consumption andimprove reliability even though sizes of components constituting thememory device are reduced due to demand for high integration.

The inventive concepts also provides a method of fabricating across-point stack-structured memory device, which has a structureconfigured to minimize power consumption and improve reliability of thememory device, the method allowing the memory device to be realizedusing a simplified process, even though sizes of components constitutingthe memory device are reduced due to demand for high integration.

According to some example embodiments, a memory device may include afirst conductive line extending over a substrate in a first direction, asecond conductive line extending over the first conductive line in asecond direction that intersects the first direction, such that thefirst conductive line and the second conductive line vertically overlapat a cross-point between the first conductive line and the secondconductive line, and a memory cell pillar at the cross-point between thefirst conductive line and the second conductive line. The memory cellpillar may be connected at opposite ends to the first conductive lineand the second conductive line, respectively. The memory cell pillar mayinclude a heating electrode layer and a resistive memory layer. Theresistive memory layer may contact the heating electrode layer. Theresistive memory layer may include a wedge memory portion having aninclined sidewall such that the wedge memory portion has a width thatincreases continuously in proportion with increasing distance from theheating electrode layer, and a body memory portion connected to thewedge memory portion such that the body memory portion and the wedgememory portion comprise an individual and continuous layer, the bodymemory portion having a greater width than the wedge memory portion.

According to some example embodiments, a memory device may include afirst conductive line extending over a substrate in a first direction, apair of second conductive lines extending over the first conductive linein a second direction that intersects the first direction, such that thefirst conductive line vertically overlaps each second conductive line ata separate cross-point of a pair of cross-points, a pair of memory cellpillars, each separate memory cell pillar of the pair of memory cellpillars at a separate cross-point of the pair of cross-points betweenthe first conductive line and the pair of second conductive lines, aheating electrode layer shared by the pair of memory cell pillars, afirst resistive memory layer comprising a first memory cell pillar ofthe pair of memory cell pillars, and a second resistive memory layercomprising a second memory cell pillar of the pair of memory cellpillars. The first resistive memory layer may include a first wedgememory portion contacting a first portion of the heating electrode layerand having a first sidewall that is inclined such that the first wedgememory portion has a width that increases continuously in proportionwith increasing distance from the first portion, and a first body memoryportion connected to the first wedge memory portion such that the firstbody memory portion and the first wedge memory portion comprise anindividual and continuous layer, the first body memory portion having agreater width than the first wedge memory portion. The second resistivememory layer may include a second wedge memory portion contacting asecond portion of the heating electrode layer and having a secondsidewall that is inclined such that the second wedge memory portion hasa width that increases continuously in proportion with increasingdistance from the second portion, and a second body memory portionintegrally connected to the second wedge memory portion such that thesecond body memory portion and the second wedge memory portion compriseanother individual and continuous layer, the second body memory portionhaving a greater width than the second wedge memory portion.

According to some example embodiments, a method of fabricating a memorydevice may include forming a first conductive line over a substrate,forming a pair of first insulating walls over the first conductive line,the pair of first insulating walls are spaced apart from each other witha filling space therebetween, forming a preliminary heating electrodelayer, an insulating spacer layer and a gap-fill insulating film in thefilling space, such that the preliminary heating electrode layerconformally covers the pair of first insulating walls and the firstconductive line, and the insulating spacer layer and the gap-fillinsulating film sequentially cover the preliminary heating electrodelayer, forming a lowered insulating spacer layer based on performing afirst etching process in which an upper portion of the insulating spacerlayer in the filling space is selectively etched as much as a certainthickness, forming a heating electrode layer and a first insulatingspacer in the filling space based on performing a second etching processin which a portion of the lowered insulating spacer layer is removedwhile an upper portion of the preliminary heating electrode layer isselectively etched, wherein the heating electrode layer has a topsurface that is at a lower level than a top surface of the loweredinsulating spacer layer, and the first insulating spacer has an inclinedsidewall, and forming a resistive memory layer in a region at leastpartially defined by the heating electrode layer, the inclined sidewallof the first insulating spacer, the pair of first insulating walls, andthe gap-fill insulating film in the filling space.

The memory device according to the inventive concepts may minimize powerconsumption and exhibit improved reliability by improving heatingefficiency upon switching operation even though sizes of componentsconstituting the memory device having a cross-point stack structure arereduced.

The method of fabricating a memory device, according to the inventiveconcepts, allows a cross-point stack-structured memory device, which hasa structure configured to improving heating efficiency upon switchingoperation by minimized power consumption, to be formed by a simplifiedprocess, even though sizes of components constituting the memory deviceare reduced.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments of the inventive concepts will be more clearly understoodfrom the following detailed description taken in conjunction with theaccompanying drawings in which:

FIG. 1 is an equivalent circuit diagram of a portion of a memory deviceaccording to some example embodiments;

FIG. 2 is a schematic planar layout diagram illustrating main componentsof a memory device according to some example embodiments;

FIG. 3A is a perspective view illustrating main components of a memorydevice according to some example embodiments, FIG. 3B illustratescross-sectional views respectively taken along lines A-A′, B1-B1′, andB2-B2′ of FIGS. 2 and 3A, FIG. 3C is an enlarged cross-sectional view ofa partial region of FIG. 3B, FIG. 3D is a schematic perspective view ofa heating electrode layer of the memory device of FIG. 3A, and FIG. 3Eis a schematic perspective view of a resistive memory layer of thememory device of FIG. 3A;

FIG. 4 illustrates cross-sectional views of a memory device according tosome example embodiments;

FIG. 5A illustrates cross-sectional views of a memory device accordingto some example embodiments, FIG. 5B is an enlarged cross-sectional viewof a partial region of FIG. 5A, FIG. 5C is a schematic perspective viewof a heating electrode layer of the memory device of FIG. 5A, and FIG.5D is a schematic perspective view of a resistive memory layer of thememory device of FIG. 5A;

FIG. 6 illustrates cross-sectional views of a memory device according tosome example embodiments;

FIG. 7A illustrates cross-sectional views of a memory device accordingto some example embodiments, FIG. 7B is an enlarged cross-sectional viewof a partial region of FIG. 7A, and FIG. 7C is a schematic perspectiveview of a resistive memory layer of the memory device of FIG. 7A;

FIG. 8A illustrates cross-sectional views of a memory device accordingto some example embodiments, and FIG. 8B is an enlarged cross-sectionalview of a partial region of FIG. 8A;

FIG. 9A illustrates cross-sectional views of a memory device accordingto some example embodiments, and FIG. 9B is an enlarged cross-sectionalview of a partial region of FIG. 9A;

FIG. 10A illustrates cross-sectional views of a memory device accordingto some example embodiments, and FIG. 10B is an enlarged cross-sectionalview of a partial region of FIG. 10A;

FIG. 11 is a perspective view of a memory device according to someexample embodiments;

FIG. 12A is a perspective view of a memory device according to someexample embodiments, and FIG. 12B is a cross-sectional view taken alonga line A-A′ of FIG. 12A;

FIGS. 13A to 13N are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments;

FIGS. 14A to 14F are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments;

FIGS. 15A to 15C are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments;

FIGS. 16A to 16F are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments;

FIGS. 17A to 17G are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments; and

FIGS. 18A to 18G are cross-sectional views illustrating a method offabricating a memory device, according to some example embodiments.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Hereinafter, embodiments of the inventive concepts will be described indetail with reference to the accompanying drawings. Like components willbe denoted by like reference numerals throughout the specification, andrepeated descriptions thereof will be omitted.

FIG. 1 is an equivalent circuit diagram of a portion of a memory device10 according to some example embodiments.

Referring to FIG. 1, the memory device 10 includes word lines WL1 andWL2, which extend along a first direction (X direction) and are spacedapart from each other in a second direction (Y direction) that isperpendicular to the first direction, and bit lines BL1, BL2, BL3, andBL4, which are spaced apart from the word lines WL1 and WL2 in a thirddirection (Z direction) and extend along the second direction.

The memory device 10 includes a plurality of memory cells MC, which arerespectively arranged at cross-points between the word lines WL1 and WL2and the bit lines BL1, BL2, BL3, and BL4. Each of the plurality ofmemory cells MC may include a resistive memory layer RM for storinginformation (“configured to store information”) and a selection devicelayer S for selecting a memory cell (“configured to select a memorycell”). The selection device layer S may be electrically connected toone of the word lines WL1 and WL2, the resistive memory layer RM may beelectrically connected to one of the bit lines BL1, BL2, BL3, and BL4,and the resistive memory layer RM and the selection device layer S maybe connected to each other in series. However, the inventive concepts isnot limited thereto, the resistive memory layer RM may be connected to aword line, and the selection device layer S may be connected to a bitline.

To drive the memory device, voltage may be applied to the resistivememory layer RM of each memory cell MC through the word lines WL1 andWL2 and the bit lines BL1, BL2, BL3, and BL4, whereby current may flowthrough the resistive memory layer RM. An arbitrary memory cell MC maybe addressed by performing selection from the word lines WL1 and WL2 andthe bit lines BL1, BL2, BL3, and BL4, and the memory cell MC may beprogrammed by applying a certain signal between the word lines WL1 andWL2 and the bit lines BL1, BL2, BL3, and BL4. In addition, a value ofcurrent may be measured through the bit lines BL1, BL2, BL3, and BL4,whereby information according to a value of resistance of the resistivememory layer RM of the corresponding memory cell MC, that is, programmedinformation may be read.

FIGS. 2 to 3C are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 2 is a schematicplanar layout diagram illustrating main components of a memory device100, FIG. 3A is a perspective view illustrating the main components ofthe memory device 100, and FIG. 3B illustrates cross-sectional viewsrespectively taken along lines A-A′, B1-B1′, and B2-B2′ of FIGS. 2 and3A. FIG. 3C is an enlarged cross-sectional view of a dashed-line region100X of FIG. 3B. The memory device 100 shown in FIGS. 2 to 3C may havethe same equivalent circuit configuration as the memory device 10 shownin FIG. 1.

Referring to FIGS. 2 to 3B, the memory device 100 includes a pluralityof first conductive lines 110 extending parallel to each other over asubstrate 102 in a first direction (X direction), and a plurality ofsecond conductive lines 170 extending parallel to each other in a seconddirection (Y direction) that intersects the first direction. Althoughthe case that the first direction and the second direction areorthogonal to each other is illustrated in this example, the inventiveconcepts are not limited thereto.

An interlayer dielectric 104 may be arranged on the substrate 102. Theinterlayer dielectric 104 is configured to electrically isolate theplurality of first conductive lines 110 from the substrate 102, and mayinclude an oxide film, a nitride film, or combinations thereof.

In some example embodiments, the plurality of first conductive lines 110may constitute a plurality of word lines WL1 and WL2 shown in FIG. 1,and the plurality of second conductive lines 170 may constitute aplurality of bit lines BL1, BL2, BL3, and BL4 shown in FIG. 1. In someexample embodiments, the plurality of first conductive lines 110 mayconstitute the plurality of bit lines BL1, BL2, BL3, and BL4, and theplurality of second conductive lines 170 may constitute the plurality ofword lines WL1 and WL2. A plurality of first insulating patterns 112 mayeach be formed between two (adjacent) conductive lines of the pluralityof first conductive lines 110, and a plurality of second insulatingpatterns 172 may each be formed between two (adjacent) conductive linesof the plurality of second conductive lines 170. Each insulating patternof the plurality of first insulating patterns 112 and the plurality ofsecond insulating patterns 172 may include a silicon oxide film, asilicon nitride film, or combinations thereof.

Each conductive line of the plurality of first conductive lines 110 andthe plurality of second conductive lines 170 may include a metal, aconductive metal nitride, a conductive metal oxide, or combinationsthereof. Each conductive line of the plurality of first conductive lines110 and the plurality of second conductive lines 170 may include W, Ti,Ta, Al, Cu, C, CN, TiN, TiAlN, TiSiN, TiCN, TiCSiN, WN, CoSiN, WSiN,TaN, TaCN, TaSiN, Au, Ag, Ir, Pt, Pd, Ru, Zr, Rh, Ni, Co, Cr, Sn, Zn,ITO, alloys thereof, or combinations thereof. Each of the plurality offirst conductive lines 110 and the plurality of second conductive lines170 may further include a conductive barrier film. The conductivebarrier film may include, for example, Ti, TiN, Ta, TaN, or combinationsthereof.

A memory cell pillar P1 constituting a memory cell MC may be arranged ateach cross-point CP-1 of a plurality of cross-points CP-1 between theplurality of first conductive lines 110 and the plurality of secondconductive lines 170. Each cross-point CP-1 may be represented as avertically-extending volume that extends through each of a particularfirst conductive line 110 and a particular second conductive line 170.As shown in FIG. 3B and FIG. 3C, each cross-point CP-1 may berepresented as a vertically-extending axis that intersects both aparticular first conductive line 110 and a particular second conductiveline 170. A plurality of memory cell pillars P1 may be insulated fromeach other by a plurality of first insulating walls 116A and a pluralityof second insulating walls 116B. Each insulating wall of the pluralityof first insulating walls 116A and the plurality of second insulatingwalls 116B may include a silicon nitride film or a silicon oxide film.

A pair of memory cell pillars P1 is arranged between the plurality offirst insulating walls 116A arranged in a row along the first direction(X direction). The plurality of second insulating walls 116B extendparallel to each other in the first direction (X direction), and theplurality of second insulating walls 116B and the plurality of memorycell pillars P1 are alternately arranged one by one along the seconddirection (Y direction). As shown in FIGS. 2-3C, a first insulating wall116A may contact a memory cell pillar P1.

Each of the plurality of memory cell pillars P1 may include a heatingelectrode layer 120, a resistive memory layer 130, and an electrodelayer 140, which are stacked on a first conductive line 110 in thisstated order (e.g., “sequentially”).

FIG. 3D is a schematic perspective view of the heating electrode layer120.

Referring to FIGS. 3A to 3D, the heating electrode layer 120 may have anapproximately U-shaped cross-section. The heating electrode layer 120may include a base portion 120B extending parallel or substantiallyparallel (e.g., parallel within manufacturing tolerances and/or materialtolerances) to the first conductive line 110, and two fin portions 120P(a first fin portion and a second fin portion, respectively) extendingfrom both (“opposite”) ends of the base portion 120B in a direction awayfrom the first conductive line 110. As shown in FIG. 3D, each finportion 120P may include including a top contact surface 120T that isdistal in the fin portion 120P from the first conductive line 110, thetop contact surface 120T of the fin portion 120P contacting a bottomcontact surface 130C of the wedge memory portion 130W. A fin portion120P may extend in a direction that is approximately perpendicular(e.g., perpendicular within manufacturing tolerances and/or materialtolerances) to a main surface of the substrate 102, and an includedangle θ11 between the base portion 120B and the fin portion 120P may beapproximately a right angle (e.g., a right angle within manufacturingtolerances and/or material tolerances). In the memory device 100, oneheating electrode layer 120 may be shared by two memory cell pillars P1,as shown in at least FIG. 3C. A first insulating spacer 122 and agap-fill insulating film 124 are stacked on the one heating electrodelayer 120 shared by the two memory cell pillars P1 in this stated order(e.g., “sequentially”). The two memory cell pillars P1 sharing the oneheating electrode layer 120 may be insulated from each other by thefirst insulating spacer 122 and the gap-fill insulating film 124. Thefirst insulating spacer 122 may have an approximately U-shapedcross-section.

As shown in at least FIG. 3C, a pair of memory cell pillars P1 are onopposite sides of the first insulating spacer 122 and gap-fillinsulating film 124, such that one memory cell pillar P1 includes afirst resistive memory layer 130 and the other memory cell pillar P1includes a second resistive memory layer 130. As shown in at least FIG.3C, each memory cell pillar P1 may be connected at opposite ends to thefirst conductive line 110 and the second conductive line 170,respectively. As shown in at least FIG. 3C and 3D, the first resistivememory layer 130 may include a first wedge memory portion 130Wcontacting a first portion 120-1 of the heating electrode layer 120 andhaving a first inclined sidewall 130S that is inclined such that thefirst wedge memory portion 130W has a width that increases continuouslyin proportion with increasing distance from the first portion 120-1, afirst body memory portion 130B connected to the first wedge memoryportion 130W such that the first body memory portion 130B and the firstwedge memory portion 130W comprise an individual and continuous layer,the first body memory portion 130B having a greater width than the firstwedge memory portion 130W. The second resistive memory layer 130 mayinclude a second wedge memory portion 130W contacting a second portion120-2 of the heating electrode layer 120 and having a second inclinedsidewall 130S that is inclined such that the second wedge memory portion130 has a width that increases continuously in proportion withincreasing distance from the second portion 120-2, and a second bodymemory portion 130B integrally connected to the second wedge memoryportion 130W such that the second body memory portion 130B and thesecond wedge memory portion 130W comprise another individual andcontinuous layer, the second body memory portion 130B having a greaterwidth than the second wedge memory portion 130W. As shown in FIG. 3C,where the first insulating spacer 122 is between the heating electrodelayer 120 and a gap-fill insulating film 124 that is between a firstmemory cell pillar P1 and a second memory cell pillar P1, the firstinsulating spacer 122 may include a first portion 122-1 contacting thefirst inclined sidewall 130S of the first wedge memory portion 130W anda second portion 122-2 contacting the second inclined sidewall 130S ofthe second wedge memory portion 130W.

The first insulating spacer 122 may include a material having etchselectivity that is different from that of a material constituting theplurality of first insulating walls 116A and the plurality of secondinsulating walls 116B, and the gap-fill insulating film 124 may includea material having etch selectivity that is equal or similar to that ofthe material constituting the plurality of first insulating walls 116Aand the plurality of second insulating walls 116B. For example, theplurality of first insulating walls 116A, the plurality of secondinsulating walls 116B, and the gap-fill insulating film 124 may includea silicon nitride film, and the first insulating spacer 122 may includea silicon oxide film, without being limited thereto. As shown in atleast FIG. 3C, the first insulating spacer 122 may contact each elementof the base portion 120B, a fin portion 120P, a wedge memory portion130W, and a body memory portion 130B, and the first insulating spacer122 has a bottom surface 122B contacting the base portion 120B and a topsurface 122T contacting the body memory portion 130B.

The heating electrode layer 120 may heat the resistive memory layer 130in a set or reset operation. The heating electrode layer 120 may includea material configured to generating sufficient heat for phase-change ofthe resistive memory layer 130 while not reacting with the resistivememory layer 130. The heating electrode layer 120 may include a metal, ametal nitride, an alloy, or a carbon-based conductive material. Forexample, the heating electrode layer 120 may include TiN, TiSiN, TiAlN,TaSiN, TaAlN, TaN, WSi, WN, TiW, MoN, NbN, TiBN, ZrSiN, WSiN, WBN,ZrAlN, MoAlN, TiAl, TiON, TiAlON, WON, TaON, C, SiC, SiCN, CN, TiCN,TaCN, or combinations thereof.

FIG. 3E is a schematic perspective view of the resistive memory layer130.

Referring to FIGS. 3A to 3E, the resistive memory layer 130 includes awedge memory portion 130W, which has an inclined sidewall 130S so as tohave a gradually decreasing width with decreasing distance from theheating electrode layer 120, and a body memory portion 130B, which isintegrally connected to the wedge memory portion 130W and has a greaterwidth than the wedge memory portion 130W. Restated, the wedge memoryportion 130W has an inclined sidewall 130S such that the wedge memoryportion 130W has a width that increases continuously in proportion withincreasing distance from the heating electrode layer 120, and the bodymemory portion 130B has a greater width than the wedge memory portion130W. As shown in FIG. 3E, by being integrally connected with eachother, the wedge memory portion 130W and the body memory portion 130Bcomprise an individual and continuous resistive memory layer 130. Thewedge memory portion 130W has a bottom contact surface 130C that isfarthest therein (“distal in the wedge memory portion 130W”) from thebody memory portion 130B. The bottom contact surface 130C may contact atop contact surface 120T that is farthest (“distal”) in the fin portion120P of the heating electrode layer 120 from the first conductive line110.

An included angle θ12 between the inclined sidewall 130S of the wedgememory portion 130W and a horizontal plane 130X parallel orsubstantially parallel to the main surface (X-Y plane) of the substrate102 may be an acute angle. In some example embodiments, the includedangle θ12 may be selected from a range of about 80° to about 88°,without being limited thereto. The body memory portion 130B may have anapproximately, or “substantially,” constant width (e.g., constant widthwithin manufacturing tolerances and/or material tolerances) withincreasing distance from the substrate 102.

When the terms “about,” “approximately,” or “substantially” are used inthis specification in connection with a numerical value, it is intendedthat the associated numerical value include a tolerance of ±10% aroundthe stated numerical value. When ranges are specified, the rangeincludes all values therebetween such as increments of 0.1%.

The resistive memory layer 130 may include a phase-change material,which is configured to reversibly change between an amorphous state(“phase”) and a crystalline state (“phase”) depending upon heating time(e.g., duration of heating of the resistive memory layer 130). Forexample, the resistive memory layer 130 may include a material, which isconfigured to have a reversible change in phase due to Joule heatgenerated by a voltage applied to both ends of the resistive memorylayer 130 and having a change in resistance due to such phase change.

Referring back to FIG. 3C, where a pair of memory cell pillars P1 arepresent and include respective first and second resistive memory layers130 that share a heating electrode layer 120, the first wedge memoryportion 130W may contact a first top contact surface 120T of the firstfin portion 120P, and the second wedge memory portion 130W may contact asecond top contact surface 120T of the second fin portion 120P. A firstincluded angle θ12 between the first inclined sidewall 130S and ahorizontal plane substantially parallel to a main surface of thesubstrate 102 may be an acute angle, and a second included angle θ12between the second inclined sidewall 130S and the horizontal plane mayalso be an acute angle. At least one element of the first wedge memoryportion 130W and the second wedge memory portion 130W may have a widththat increases continuously in proportion with increasing distance fromthe heating electrode layer 120.

In some example embodiments, the resistive memory layer 130 may includea chalcogenide material as the phase-change material. In some exampleembodiments, the resistive memory layer 130 may include Ge—Sb—Te (GST).For example, Ge—Sb—Te of the resistive memory layer 130 may include amaterial such as Ge₂Sb₂Te₅, Ge₂Sb₂Te₇, Ge₁Sb₂Te₄, or Ge₁Sb₄Te₇. Theresistive memory layer 130 may include various chalcogenide materialsother than Ge—Sb—Te set forth above. For example, the resistive memorylayer 130 may include, as the chalcogenide material, a materialincluding at least two elements selected from among Si, Ge, Sb, Te, Bi,In, Sn, and Se. In some example embodiments, the resistive memory layer130 may further include at least one impurity selected from among B, C,N, O, P, and S. The at least one impurity may change a driving currentof the memory device 100. In addition, the resistive memory layer 130may further include a metal. For example, the resistive memory layer 130may include at least one metal selected from among Al, Ga, Zn, Ti, Cr,Mn, Fe, Co, Ni, Mo, Ru, Pd, Hf, Ta, Ir, Pt, Zr, Tl, Pd, and Po. In someexample embodiments, the resistive memory layer 130 may have amultilayer structure, in which two or more layers having differentproperties are stacked. The number or thicknesses of a plurality oflayers constituting the multilayer structure may be freely selected. Forexample, the resistive memory layer 130 may have a superlatticestructure, in which a plurality of layers including different materialsare alternately stacked.

A material constituting the resistive memory layer 130 is not limited tophase-change materials. The resistive memory layer 130 may includevarious materials having resistance-change properties. In some exampleembodiments, the resistive memory layer 130 may include a transitionmetal oxide, and in this case, the memory device 100 may constitute aresistive RAM (ReRAM) device. In some example embodiments, the resistivememory layer 130 may have a magnetic tunnel junction (MJT) structure,which includes: two electrodes including magnetic substances; and adielectric between the two electrodes, and in this case, the memorydevice 100 may constitute a magnetic RAM (MRAM) device.

The electrode layer 140 may include a metal, a conductive metal nitride,a conductive metal oxide, or combinations thereof. For example, theelectrode layer 140 may include W, Ti, Ta, Al, Cu, C, CN, TiN, TiAlN,TiSiN, TiCN, TiCSiN, WN, CoSiN, WSiN, TaN, TaCN, TaSiN, or combinationsthereof.

In one memory cell pillar P1, the heating electrode layer 120, theresistive memory layer 130, and the electrode layer 140 may be alignedwith a sidewall 116 a-s of a first insulating wall 116A. The fin portion120P, the wedge memory portion 130W, and the body memory portion 130Bmay each contact a sidewall 116 a-s of the first insulating wall 116Aand vertically overlap each other between a first conductive line 110and a second conductive line 170. The first insulating spacer 122 maycontact the fin portion 120P of the heating electrode layer 120, and thewedge memory portion 130W and the body memory portion 130B of theresistive memory layer 130. The fin portion 120P and the wedge memoryportion 130W are spaced apart from the gap-fill insulating film 124 withthe first insulating spacer 122 therebetween. The fin portion 120P, thewedge memory portion 130W, and the body memory portion 130B mayvertically overlap each other (e.g., overlap each other along an axisextending between the overlapping first and second conductive lines 110and 170), as shown in at least FIG. 3C. The first insulating spacer 122may have a bottom surface 122B, which contacts the base portion 120B ofthe heating electrode layer 120, and a top surface 122T, which contactsthe body memory portion 130B of the resistive memory layer 130, and theheight of the first insulating spacer 122 may be defined by the baseportion 120B and the body memory portion 130B.

The first insulating spacer 122 may at least partially fill a reentrantcorner portion C1 between (e.g., at least partially defined by) the baseportion 120B and the fin portion 120P of the heating electrode layer120. The first insulating spacer 122 may have inclined sidewalls 122Srespectively contacting and covering inclined sidewalls 130S of twowedge memory portions 130W that are on both (opposite) sides with thefirst insulating spacer 122 therebetween. A top surface 140T of theelectrode layer 140 and a top surface 124T of the gap-fill insulatingfilm 124 may extend on the same (“common”) plane.

The plurality of memory cell pillars P1 may each further include aplurality of stacked structures each including a first interfacial layer152, a selection device layer 154, a second interfacial layer 156, andan electrode layer 160, which are stacked on the electrode layer 140 inthis stated order, and an insulating film 162 filling spaces between theplurality of stacked structures.

Each of the first interfacial layer 152 and the second interfacial layer156 may include a conductive material, for example, carbon (C). In someexample embodiments, the first interfacial layer 152 and the secondinterfacial layer 156 may be omitted. The selection device layer 154 maycorrespond to the selection device layer S shown in FIG. 1. Theselection device layer 154 may include an amorphous chalcogenideswitching material. The selection device layer 154 may include amaterial layer configured to have resistance varying depending uponamplitudes of voltages applied to both ends of the selection devicelayer 154. For example, the selection device layer 154 may include anOvonic threshold switching (OTS) material. The OTS material may includea chalcogenide switching material. In some example embodiments, theselection device layer 154 may include Si, Te, As, Ge, In, orcombinations thereof. The selection device layer 154 may further includea nitrogen atom (N). A material constituting the selection device layer154 is not limited to the examples set forth above, and the selectiondevice layer 154 may include various material layers configured tofunction to select a device. Descriptions of the electrode layer 160 aresubstantially the same as the descriptions of the electrode layer 140.The insulating film 162 may include an oxide film, a nitride film, orcombinations thereof.

In the memory device 100 described with reference to FIGS. 2 to 3E, thetop contact surface 120T of the fin portion 120P included in the heatingelectrode layer 120 contacts the bottom contact surface 130C of thewedge memory portion 130W included in the resistive memory layer 130,whereby a contact area between the heating electrode layer 120 and theresistive memory layer 130 may be minimized, and heating efficiency maybe improved when current is applied through the heating electrode layer120. Therefore, in a cross-point stack-structured memory device, eventhough sizes of components constituting the memory device are reduceddue to the demand for high integration, power consumption may beminimized by reducing reset current, and reliability may be improved byimproving heating efficiency upon switching operation. As a result, thefunctioning of a device that includes the cross-point stack-structuredmemory device, including an electronic device, may be improved.

FIG. 4 illustrates cross-sectional views of a memory device according tosome example embodiments.

Referring to FIG. 4, a memory device 100A has substantially the sameconfiguration as the memory device 100 shown in FIGS. 3A and 3B.However, in a plurality of memory cell pillars P1A of the memory device100A, the plurality of stacked structures, in which the firstinterfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order (“sequentially”), and the insulating film 162 filling thespaces between the plurality of stacked structures are arranged betweenthe plurality of first conductive lines 110 and a plurality of heatingelectrode layers 120. Thus, each of the plurality of memory cell pillarsP1A may have a structure in which the first interfacial layer 152contacts the first conductive line 110 and the electrode layer 140contacts the second conductive line 170.

FIGS. 5A and 5B are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 5A illustratescross-sectional views of main components, which correspond tocross-sections respectively taken along the lines A-A′, B1-B1′, andB2-B2′ of FIG. 2. FIG. 5B is an enlarged cross-sectional view of adashed-line region 200X of FIG. 5A.

Referring to FIGS. 5A and 5B, a memory device 200 has substantially thesame configuration as the memory device 100 shown in FIGS. 3A and 3B.However, in the memory device 200, a plurality of first insulating walls216A have inclined sidewalls SW facing a plurality of memory cellpillars P2. The plurality of first insulating walls 216A may each havean increasing width in the X direction with decreasing distance from thesubstrate 102. In the plurality of memory cell pillars P2, a heatingelectrode layer 220, a resistive memory layer 230, and an electrodelayer 240 may contact an inclined sidewall SW of a first insulating wall216A to be aligned with the inclined sidewall SW, and may verticallyoverlap each other.

FIG. 5C is a schematic perspective view of the heating electrode layer220, and FIG. 5D is a schematic perspective view of the resistive memorylayer 230.

Referring to FIGS. 5A to 5D, the heating electrode layer 220, theresistive memory layer 230, and the electrode layer 240 may respectivelyhave substantially the same configurations as the heating electrodelayer 120, the resistive memory layer 130, and the electrode layer 140described with reference to FIGS. 3A to 3E. However, the heatingelectrode layer 220 includes a base portion 220B extending parallel orsubstantially parallel to the plurality of first conductive lines 110,and two inclined fin portions 220P each extending in a direction awayfrom the substrate 102 along the inclined sidewall SW of the firstinsulating wall 216A. An included angle θ21 between the base portion220B and an inclined fin portion 220P may be an obtuse angle. In thememory device 200, one heating electrode layer 220 may be shared by twomemory cell pillars P2.

The resistive memory layer 230 includes a wedge memory portion 230W,which has both inclined sidewalls 230S1 and 230S2 (a first sidewall anda second sidewall, respectively) facing in opposite directions to eachother so as to have a gradually decreasing width with decreasingdistance from the heating electrode layer 220, and a body memory portion230B, which is integrally connected to the wedge memory portion 230W andhas a greater width than the wedge memory portion 230W. The wedge memoryportion 230W has a bottom contact surface 230C that is farthest thereinfrom the body memory portion 230B. The bottom contact surface 230C maycontact a top contact surface 220T that is farthest (“distal”) in thefin portion 220P of the heating electrode layer 220 from the firstconductive line 110. The fin portion 220P, the wedge memory portion230W, and the body memory portion 230B may vertically overlap eachother.

Included angles θ22 and θ23 between both the inclined sidewalls 230S1and 230S2 of the wedge memory portion 230W and a horizontal planeparallel to the main surface (X-Y plane) of the substrate 102 may berespectively acute angles. Restated, a first included angle θ22 betweenthe first sidewall 230S1 and a horizontal plane 230X that issubstantially parallel to a main surface of the substrate is an acuteangle, and a second included angle θ23 between the second sidewall 230S2and the horizontal plane 230X is also an acute angle. The included angleθ22 between the sidewall 230S1 and the horizontal plane may be equal toor different from the included angle θ23 between the sidewall 230S2 andthe horizontal plane. In some example embodiments, one or more of theincluded angles θ22 and θ23 may be an obtuse angle.

In the memory device 200, descriptions of the heating electrode layer220, the resistive memory layer 230, the electrode layer 240, the firstinsulating wall 216A, and a second insulating wall 216B aresubstantially the same as the descriptions made as to the heatingelectrode layer 120, the resistive memory layer 130, the electrode layer140, the first insulating wall 116A, and the second insulating wall 116Bwith reference to FIGS. 3A to 3C.

FIG. 6 illustrates cross-sectional views of a memory device according tosome example embodiments.

Referring to FIG. 6, a memory device 200A has substantially the sameconfiguration as the memory device 200 shown in FIG. 5A. However, thememory device 200A includes a plurality of second insulating walls 216Cdefining widths of a plurality of memory cell pillars P2A in the seconddirection (Y direction). As shown in FIG. 6, the plurality of secondinsulating walls 216C may each have an inclined sidewall so as to havean increasing width in the second direction (Y direction) withincreasing distance from the substrate 102. Thus, in the seconddirection (Y direction), the width of each of the heating electrodelayer 220, the resistive memory layer 230, and the electrode layer 240may gradually increase with decreasing distance from the substrate 102.Descriptions of the plurality of second insulating walls 216C aresubstantially the same as the descriptions made as to the plurality ofsecond insulating walls 116B with reference to FIGS. 3A to 3C.

FIGS. 7A to 7C are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 7A illustratescross-sectional views of main components, which correspond tocross-sections respectively taken along the lines A-A′, B1-B1′, andB2-B2′ of FIG. 2. FIG. 7B is an enlarged cross-sectional view of adashed-line region 300X of FIG. 7A. FIG. 7C is a schematic perspectiveview of a resistive memory layer of a memory device of FIG. 7A.

Referring to FIGS. 7A and 7B, a memory device 300 has substantially thesame configuration as the memory device 200 shown in FIGS. 5A and 5B.However, in the memory device 300, an upper portion of each of theplurality of first insulating walls 216A and a plurality of secondinsulating walls 216B may have an inclined sidewall 216S. In addition,an upper portion of the gap-fill insulating film 124 may have aninclined sidewall 124S.

Each of a plurality of memory cell pillars P3 includes a resistivememory layer 330 and an electrode layer 340, which are stacked on theheating electrode layer 220 in this stated order. Each of the resistivememory layer 330 and the electrode layer 340 may contact and be alignedwith the inclined sidewall 216S and the inclined sidewall 124S, and mayhave gradually increasing widths in the X direction and the Y directionwith increasing distance from the substrate 102.

The heating electrode layer 220 has the same configuration as describedwith reference to FIGS. 5A to 5C. The resistive memory layer 330 and theelectrode layer 340 may respectively have substantially the sameconfigurations of the resistive memory layer 130 and the electrode layer140, which have been described with reference to FIGS. 3A to 3E.However, each of the resistive memory layer 330 and the electrode layer340 may have gradually decreasing widths in the X direction and the Ydirection with decreasing distance from the heating electrode layer 220.

FIG. 7C is a schematic perspective view of the resistive memory layer330.

Referring to FIGS. 7A to 7C, the resistive memory layer 330 may includea wedge memory portion 330W, which has both inclined sidewalls 330S1 and330S2, and a body memory portion 330B, which is integrally connected tothe wedge memory portion 330W and has a greater width than the wedgememory portion 330W. The wedge memory portion 330W has a bottom contactsurface 330C that is farthest therein from the body memory portion 330B.The bottom contact surface 330C may contact the top contact surface 220T(see FIG. 5C) included in the fin portion 220P of the heating electrodelayer 220. The fin portion 220P of the heating electrode layer 220, andthe wedge memory portion 330W and the body memory portion 330B of theresistive memory layer 330 may vertically overlap each other.

Included angles θ32 and θ33 between both the inclined sidewalls 330S1and 330S2 of the wedge memory portion 330W and a horizontal plane 330Xparallel or substantially parallel to the main surface (X-Y plane) ofthe substrate 102 may be respectively acute angles. In some exampleembodiments, the included angle θ32 between the sidewall 330S1 and thehorizontal plane may be equal to or different from the included angleθ33 between the sidewall 330S2 and the horizontal plane. The body memoryportion 330B may include an inclined sidewall BS3, and the body memoryportion 330B thus may have a width that increases continuously inproportion with increasing distance from the wedge memory portion 330W,as shown in at least FIGS. 7A-7C.

In the memory device 300, descriptions of the resistive memory layer 330and the electrode layer 340 are substantially the same as thedescriptions made as to the resistive memory layer 130 and the electrodelayer 140 with reference to FIGS. 3A to 3C.

FIGS. 8A and 8B are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 8A illustratescross-sectional views of main components, which correspond tocross-sections respectively taken along the lines A-A′, B1-B1′, andB2-B2′ of FIG. 2. FIG. 8B is an enlarged cross-sectional view of adashed-line region 400X of FIG. 8A.

Referring to FIGS. 8A and 8B, a memory device 400 has substantially thesame configuration as the memory device 200 shown in FIGS. 5A and 5B.However, in the memory device 400, the heating electrode layer 220 ineach of spaces between the plurality of first insulating walls 216Aincludes a pair of heating electrode layers 220R1 and 220R2 spaced apartfrom each other. Each of the pair of heating electrode layers 220R1 and220R2 constitutes a different memory cell pillar P4.

The gap-fill insulating film 124 contacting the first conductive line110 is arranged between the pair of separated heating electrode layers220R1 and 220R2. Each separated insulating spacer 122SP is arrangedbetween a separated heating electrode layer 220R1 and the gap-fillinsulating film 124 and between a separated heating electrode layer220R2 and the gap-fill insulating film 124. The separated insulatingspacer 122SP contacts one of the pair of separated heating electrodelayers 220R1 and 220R2 and also contacts the wedge memory portion 230Wand the body memory portion 230B of the resistive memory layer 230.Descriptions of the separated insulating spacer 122SP are substantiallythe same as the descriptions made as to the first insulating spacer 122with reference to FIGS. 3A to 3C.

FIGS. 9A and 9B are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 9A illustrates across-sectional view corresponding to a cross-section taken along a lineA-A′ of FIG. 2, and Y-direction cross-sectional views respectively takenalong lines marked by 9Y1 and 9Y2 in the above A-A′-line cross-sectionalview. FIG. 9B is an enlarged cross-sectional view of a dashed-lineregion 500X of FIG. 9A.

Referring to FIGS. 9A and 9B, a memory device 500 has substantially thesame configuration as the memory device 200 shown in FIGS. 5A and 5B.However, in the memory device 500, a plurality of memory cell pillars P5each includes a first insulating spacer 512 covering the inclinedsidewall SW of the first insulating wall 216A, and a heating electrodelayer 520, a resistive memory layer 530, and an electrode layer 540,which are stacked on the first conductive line 110 in this stated order.The heating electrode layer 520 includes a base portion 520B and a finportion 520P. The resistive memory layer 530 includes a wedge memoryportion 530W and a body memory portion 530B. The wedge memory portion530W contacts the fin portion 520P. The fin portion 520P and the wedgememory portion 530W are spaced apart from the first insulating wall216A, with the first insulating spacer 512 being between both of the finportion 520P and the wedge memory portion 530W and the first insulatingwall 216A. The body memory portion 530B contacts the first insulatingwall 216A. The fin portion 520P and the wedge memory portion 530Wcontact the gap-fill insulating film 124. The fin portion 520P, thewedge memory portion 530W, and the body memory portion 530B mayvertically overlap each other between the first conductive line 110 andthe second conductive line 170.

The upper portion of each of the plurality of first insulating walls216A and the plurality of second insulating walls 216B may have theinclined sidewall 216S. In addition, the upper portion of the gap-fillinsulating film 124 may have the inclined sidewall 124S. Each of theresistive memory layer 530 and the electrode layer 540 may contact andbe aligned with the inclined sidewall 216S and the inclined sidewall124S, and may have gradually increasing widths in the X direction andthe Y direction with increasing distance from the substrate 102.

As shown in at least FIG. 9B, the first insulating spacer 512 mayinclude a first portion 512-1 covering a sidewall facing in an oppositedirection to the base portion 520B out of both sidewalls of the finportion 520P, and a second portion 512-2 covering the wedge memoryportion 530W. The first insulating spacer 512 has a bottom surface 512Bcontacting the first conductive line 110 and a top surface 512Tcontacting the body memory portion 530B, and the height of the firstinsulating spacer 512 may be defined by the first conductive line 110and the body memory portion 530B.

Descriptions of the first insulating spacer 512, the heating electrodelayer 520, the resistive memory layer 530, and the electrode layer 540are respectively substantially the same as the descriptions made as tothe first insulating spacer 122, the heating electrode layer 120, theresistive memory layer 130, and the electrode layer 140 with referenceto FIGS. 3A to 3C.

FIGS. 10A and 10B are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 10A illustrates across-sectional view corresponding to the cross-section taken along theline A-A′ of FIG. 2, and Y-direction cross-sectional views respectivelytaken along lines marked by 10Y1 and 10Y2 in the above A-A′-linecross-sectional view. FIG. 10B is an enlarged cross-sectional view of adashed-line region 600X of FIG. 10A.

Referring to FIGS. 10A and 10B, a memory device 600 has substantiallythe same configuration as the memory device 200 shown in FIGS. 5A and5B. However, in the memory device 600, a plurality of memory cellpillars P6 each includes: a first insulating spacer 612 covering theinclined sidewall SW of the first insulating wall 216A; a secondinsulating spacer 614 surrounding a lower portion of the gap-fillinsulating film 124; and a heating electrode layer 620, a resistivememory layer 630, and an electrode layer 640, which are stacked on thefirst conductive line 110 in this stated order.

The heating electrode layer 620 includes a base portion 620B and a finportion 620P. The resistive memory layer 630 includes a wedge memoryportion 630W and a body memory portion 630B. The wedge memory portion630W contacts the fin portion 620P. The fin portion 620P and the wedgememory portion 630W are arranged between the first insulating spacer 612and the second insulating spacer 614. The fin portion 620P and the wedgememory portion 630W are spaced apart from the first insulating wall 216Awith the first insulating spacer 612 being between both of the finportion 620P and the wedge memory portion 630W and the first insulatingwall 216A, and are also spaced apart from the gap-fill insulating film124, with the second insulating spacer 614 being between both of the finportion 620P and the wedge memory portion 630W and the gap-fillinsulating film 124. The first insulating spacer 612 has an inclinedsidewall 612S facing the wedge memory portion 630W of the resistivememory layer 630, and the second insulating spacer 614 has an inclinedsidewall 614S facing the wedge memory portion 630W. The body memoryportion 630B of the resistive memory layer 630 contacts the firstinsulating wall 216A and the gap-fill insulating film 124. The finportion 620P, the wedge memory portion 630W, and the body memory portion630B may vertically overlap each other.

The resistive memory layer 630 and the electrode layer 640 may contactand be aligned with the inclined sidewall 216S of each of the pluralityof first insulating walls 216A and the plurality of second insulatingwalls 216B, and the inclined sidewall 124S of the gap-fill insulatingfilm 124, and may have gradually increasing widths in the X directionand the Y direction with increasing distance from the substrate 102.

The first insulating spacer 612 may have a bottom surface 612Bcontacting the first conductive line 110, and a top surface 612Tcontacting the body memory portion 630B. The height of the firstinsulating spacer 612 may be defined by the first conductive line 110and the body memory portion 630B. The first insulating spacer 612 andthe second insulating spacer 614 may be spaced apart from each otherwith the fin portion 620P therebetween. The second insulating spacer 614may have a bottom surface 614B contacting the base portion 620B, and atop surface 614T contacting the body memory portion 630B. The height ofthe second insulating spacer 614 may be defined by the base portion 620Band the body memory portion 630B. The first insulating spacer 612 andthe second insulating spacer 614 may each include a silicon oxide film,without being limited thereto.

Descriptions of the heating electrode layer 620, the resistive memorylayer 630, and the electrode layer 640 are respectively substantiallythe same as the descriptions made as to the heating electrode layer 120,the resistive memory layer 130, and the electrode layer 140 withreference to FIGS. 3A to 3C.

FIG. 11 is a perspective view of a memory device according to someexample embodiments.

Referring to FIG. 11, a memory device 700 may include, over thesubstrate 102, a plurality of lower word lines 710 extending parallel toeach other in the first direction (X direction), a plurality of commonbit lines 720 extending parallel to each other in the second direction(Y direction), and a plurality of upper word lines 730 extendingparallel to each other in the first direction (X direction). Theplurality of lower word lines 710 and the plurality of common bit lines720 may respectively correspond to the plurality of first conductivelines 110 and the plurality of second conductive lines 170, which areshown in FIGS. 3A and 3B.

A plurality of first memory cells MC1 may be respectively arranged at aplurality of cross-points between the plurality of lower word lines 710and the plurality of common bit lines 720. A plurality of second memorycells MC2 may be respectively arranged at a plurality of cross-pointsbetween the plurality of common bit lines 720 and the plurality of upperword lines 730.

Each of the plurality of first memory cells MC1 and the plurality ofsecond memory cells MC2 may include the memory cell pillar P2 describedwith reference to FIGS. 5A and 5B.

In the memory device 700, the plurality of first memory cells MC1 andthe plurality of second memory cells MC2 may be congruent with eachother as a whole by performing 90° rotation with respect to each other.The rotation angle of the plurality of second memory cells MC2 withrespect to the plurality of first memory cells MC1 is not limited to theexample shown in FIG. 11, and may be variously selected, as needed.

Although FIG. 11 shows that each of the plurality of first memory cellsMC1 and the plurality of second memory cells MC2 includes the memorycell pillar P2 shown in FIGS. 5A and 5B, the inventive concepts is notlimited thereto. For example, each of the plurality of first memorycells MC1 and the plurality of second memory cells MC2 may include amemory cell pillar selected from among the memory cell pillars P1, P2,P3, P4, P5, and P6 and structures modified and changed therefrom withoutdeparting from the spirit and scope of the inventive concepts.

FIGS. 12A and 12B are diagrams illustrating a memory device according tosome example embodiments, and in particular, FIG. 12A is a perspectiveview illustrating main components of a memory device 800 according tosome example embodiments, and FIG. 12B illustrates a cross-sectionalview of the main components, taken along a line A-A′ of FIG. 12A. InFIGS. 12A and 12B, the same reference numerals as in FIGS. 5A and 5Bdenote the same members, and descriptions thereof will be omitted.

Referring to FIGS. 12A and 12B, the memory device 800 includes a drivingcircuit area 810 on the substrate 102 and has a cell-on-peri (COP)structure, in which memory cells are arranged over the driving circuitarea 810.

In more detail, the memory device 800 includes the driving circuit area810 at a first level over the substrate 102, and the plurality of firstmemory cells MC1 and the plurality of second memory cells MC2, which areat higher levels than the first level over the substrate 102.

The driving circuit area 810 may be an area in which peripheral circuitsor driving circuits for driving the plurality of first memory cells MC1and the plurality of second memory cells MC2 are arranged. Theperipheral circuits arranged in the driving circuit area 810 may becircuits configured to processing data at high speed, the data beinginput/output to drive the plurality of first memory cells MC1 and theplurality of second memory cells MC2. In some example embodiments, theperipheral circuits may include a page buffer, a latch circuit, a cachecircuit, a column decoder, a sense amplifier, a data in/out circuit, arow decoder, or the like.

As shown in FIG. 12B, an active region AC may be defined in thesubstrate 102 by a device isolation film 103. A plurality of transistorsTR constituting the driving circuit area 810 may be formed on the activeregion AC of the substrate 102. Each of the plurality of transistors TRmay include a gate G, a gate insulating film GD, and a source/drainregion SD. An insulating spacer 806 may cover both sidewalls of the gateG, and an etch stop film 808 may be formed on the gate G and theinsulating spacer 806. The etch stop film 808 may include an insulatingmaterial such as silicon nitride, silicon oxynitride, or the like. Aplurality of interlayer dielectrics 812A, 812B, and 812C may be stackedon the etch stop film 808 in this stated order. The plurality ofinterlayer dielectrics 812A, 812B, and 812C may include silicon oxide,silicon nitride, silicon oxynitride, or the like.

The driving circuit area 810 includes a multilayer wiring structure 814electrically connected to the plurality of transistors TR. Structures ofthe multilayer wiring structure 814 may be insulated from each other bythe plurality of interlayer dielectrics 812A, 812B, and 812C. Themultilayer wiring structure 814 may include a first contact 816A, afirst wiring layer 818A, a second contact 816B, and a second wiringlayer 818B, which are stacked over the substrate 102 in this statedorder and electrically connected to each other. Each of the first wiringlayer 818A and the second wiring layer 818B may include a metal, aconductive metal nitride, a metal silicide, or combinations thereof.Although the multilayer wiring structure 814 is shown in FIGS. 12A and12B as being a double-layer wiring structure including the first wiringlayer 818A and the second wiring layer 818B, the inventive concepts isnot limited thereto. For example, the multilayer wiring structure 814may include three or more layers depending upon layouts of the drivingcircuit area 810 and kinds and arrangements of gates G.

The interlayer dielectric 104 may be formed on the plurality ofinterlayer dielectrics 812A, 812B, and 812C. Although not shown, awiring structure connecting the plurality of first memory cells MC1 andthe plurality of second memory cells MC2 to the driving circuit area 810may be arranged through the interlayer dielectric 104.

In the memory device 800, since the plurality of first memory cells MC1and the plurality of second memory cells MC2 are arranged over thedriving circuit area 810, the degree of integration of the memory device800 may be further increased.

Next, a method of fabricating a memory device, according to some exampleembodiments, will be described in detail.

FIGS. 13A to 13N are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 100 shown in FIGS. 3A and 3B will be described with reference toFIGS. 13A to 13N. FIGS. 13A to 13N illustrate cross-sectional views ofmain components, which correspond to cross-sections respectively takenalong the lines A-A′, B1-B1′, and B2-B2′ of FIG. 3A, according to aprocess order.

Referring to FIG. 13A, the interlayer dielectric 104 is formed on thesubstrate 102, and the plurality of first conductive lines 110 and theplurality of first insulating patterns 112 are formed on the interlayerdielectric 104, the plurality of first insulating patterns 112insulating the plurality of first conductive lines 110 from each other.The plurality of first conductive lines 110 may extend in one direction,for example, the X direction.

Referring to FIG. 13B, the plurality of first insulating walls 116A areformed on the plurality of first conductive lines 110 and the pluralityof first insulating patterns 112.

The plurality of first insulating walls 116A may extend parallel to eachother along the Y direction. Both sidewalls each of the plurality offirst insulating walls 116A may extend approximately in a verticaldirection (Z direction). The plurality of first insulating walls 116Amay include a nitride film or an oxide film. For example, the pluralityof first insulating walls 116A may include a silicon nitride film.

The plurality of first insulating walls 116A may each have a first widthW1 in the X direction, and may be spaced apart from each other by afirst gap G1. The first gap G1 may be about 3 times as large as thefirst width W1. The first gap G1 may provide filling spaces, which arefilled with materials required to form the plurality of memory cellpillars P1 (see FIGS. 3A to 3C). The plurality of first conductive lines110 and the plurality of first insulating patterns 112 may be exposedbetween the plurality of first insulating walls 116A by the first gapG1. The first gap G1 may be referred to as a filling space.

Referring to FIG. 13C, a preliminary heating electrode layer 120L and afirst insulating spacer layer 122L are formed to conformally cover anexposed surface of each of the plurality of first insulating walls 116A,the plurality of first conductive lines 110, and the plurality of firstinsulating patterns 112, followed by forming a preliminary gap-fillinsulating film 124L on the first insulating spacer layer 122L, thepreliminary gap-fill insulating film 124L filling spaces between theplurality of first insulating walls 116A, such that the preliminaryheating electrode layer 120L conformally covers the plurality of firstinsulating walls 116A and the first conductive line 110, and the firstinsulating spacer layer 122L and the preliminary gap-fill insulatingfilm 124L sequentially cover the preliminary heating electrode layer120L.

Descriptions of constitution materials of the preliminary heatingelectrode layer 120L, the first insulating spacer layer 122L, and thepreliminary gap-fill insulating film 124L are respectively the same asthe descriptions made as to constitution materials of the heatingelectrode layer 120, the first insulating spacer 122, and the gap-fillinsulating film 124 with reference to FIGS. 3A to 3C. The firstinsulating spacer layer 122L and the preliminary gap-fill insulatingfilm 124L may include materials having different etch selectivities fromeach other. For example, the first insulating spacer layer 122L mayinclude a silicon oxide film, and the preliminary gap-fill insulatingfilm 124L may include a silicon nitride film.

Referring to FIG. 13D, unnecessary portions over the plurality of firstinsulating walls 116A are removed to expose a top surface of each of theplurality of first insulating walls 116A, whereby the preliminaryheating electrode layer 120L, the first insulating spacer layer 122L,and the preliminary gap-fill insulating film 124L may remain onlybetween the plurality of first insulating walls 116A. During the removalof the unnecessary portions, each of the plurality of first insulatingwalls 116A, the preliminary heating electrode layer 120L, the firstinsulating spacer layer 122L, and the preliminary gap-fill insulatingfilm 124L may be reduced in thickness. To remove the unnecessaryportions, a chemical mechanical polishing (CMP) or etch-back process maybe performed.

Referring to FIG. 13E, a plurality of mask patterns M1 are formed, andthe result product of FIG. 13D is etched by using the plurality of maskpatterns M1 as an etch mask, thereby forming a plurality of stackedstructures having line shapes and including the plurality of firstinsulating walls 116A, the preliminary heating electrode layer 120L, thefirst insulating spacer layer 122L, and the preliminary gap-fillinsulating film 124L. The plurality of first insulating patterns 112 maybe exposed by line spaces LS1 between the plurality of stackedstructures.

Like the plurality of first conductive lines 110, the plurality of maskpatterns M1 may include a plurality of line patterns extending parallelto each other in the X direction. The plurality of mask patterns M1 mayinclude polysilicon, without being limited thereto.

Referring to FIG. 13F, the plurality of mask patterns M1 are removedfrom the result product of FIG. 13E, followed by forming the pluralityof second insulating walls 116B, which fill the line spaces LS1 betweenthe plurality of stacked structures. Both sidewalls of each of theplurality of second insulating walls 116B may extend approximately in avertical direction (Z direction). To form the plurality of secondinsulating walls 116B, an insulating film having a thickness enough tofill a plurality of line spaces LS1 is formed on the result product ofFIG. 13E, followed by removing an unnecessary portion of the insulatingfilm by CMP or etch-back so as to expose top surfaces of the pluralityof first insulating walls 116A, the preliminary heating electrode layer120L, the first insulating spacer layer 122L, and the preliminarygap-fill insulating film 124L. During the removal of the unnecessaryportion of the insulating film, the plurality of first insulating walls116A, the preliminary heating electrode layer 120L, the first insulatingspacer layer 122L, and the preliminary gap-fill insulating film 124L maybe reduced in height.

The plurality of second insulating walls 116B may each have a secondwidth W2 in the Y direction, and may be spaced apart from each other bya second gap G2. A width of the second gap G2 may correspond to thewidth of preliminary heating electrode layer 120L along the Y direction.

Referring to FIG. 13G, a first etching process, in which an upperportion of the first insulating spacer layer 122L of the result productof FIG. 13F is selectively etched as much as a certain thickness, isperformed, thereby reducing the height of the first insulating spacerlayer 122L to form a lowered insulating spacer layer 122L as shown inFIG. 13G.

The first etching process may be performed by using a difference betweenetch selectivities of the first insulating wall 116A, the secondinsulating wall 116B, the preliminary heating electrode layer 120L, andthe preliminary gap-fill insulating film 124L and etch selectivity ofthe first insulating spacer layer 122L. When the first insulating spacerlayer 122L includes a silicon oxide film, the first etching process mayinclude a wet etching process using a dilute HF (DHF) solution.

The height of the first insulating spacer layer 122L is adjusted duringthe first etching process, whereby heights of the resistive memory layer130 and the electrode layer 140, which are formed in subsequentprocesses, may be determined.

Referring to FIG. 13H, a second etching process, in which an upperportion of the preliminary heating electrode layer 120L of the resultproduct of FIG. 13G is selectively etched, is performed, thereby formingthe heating electrode layer 120 having a top contact surface 120T thatis at a lower level than a top surface 122T of the first insulatingspacer layer 122L. During the second etching process, a portion of the(lowered) first insulating spacer layer 122L exposed to an etchingatmosphere of the second etching process is removed together with upperportion of the preliminary heating electrode layer 120L, thereby formingthe first insulating spacer 122 having the inclined sidewalls 122S fromthe first insulating spacer layer 122L.

The second etching process may be performed by using a difference inetch selectivity between the first insulating spacer layer 122L and thepreliminary heating electrode layer 120L. In some example embodiments,when the preliminary heating electrode layer 120L includes TiN, thesecond etching process may include a wet etching process using an SC1etchant including NH₄OH, H₂O₂, and H₂O. As shown in FIG. 13H, after thesecond etching process, a surface that is distal in the fin portion 120Pof the heating electrode layer 120 from the first conductive line 110(e.g., top contact surface 120T) is exposed by a space at leastpartially defined by the inclined sidewall 122S in the filling space.

Referring to FIG. 13I, a preliminary resistive memory layer 130L isformed on the heating electrode layer 120, the preliminary resistivememory layer 130L covering the plurality of first insulating walls 116Aand the plurality of second insulating walls 116B while filling spacesdefined by the first insulating spacer 122, the plurality of firstinsulating walls 116A, and the plurality of second insulating walls116B. Restated, the preliminary resistive memory layer 130L may beformed in a region at least partially defined by the heating electrodelayer 120, the inclined sidewall 122S of the first insulating spacer122, the pair of first insulating walls 116A, and the gap-fillinsulating film 124 in the first gap G1 The preliminary resistive memorylayer 130L may include a material constituting the resistive memorylayer 130.

In forming the preliminary resistive memory layer 130L, even when theheating electrode layer 120 has an extremely small thickness, sincerelatively narrow spaces, which are defined by the first insulatingspacer 122, the plurality of first insulating walls 116A, and theplurality of second insulating walls 116B are gradually widened awayfrom a top surface of the heating electrode layer 120 because of theinclined sidewalls 122S, a material constituting the preliminaryresistive memory layer 130L may stably fill the spaces directly abovethe top surface of the heating electrode layer 120 without causingfilling defects such as voids or the like. Therefore, even when theheating electrode layer 120 has an extremely small thickness, holestructures advantageous for a filling process are provided over theheating electrode layer 120 by the inclined sidewalls 122S, whereby adeposition process for forming the preliminary resistive memory layer130L contacting the top surface of the heating electrode layer 120 maybe easily performed.

Referring to FIG. 13J, an upper portion of the preliminary resistivememory layer 130L of the result product of FIG. 13I is removed, therebyforming the resistive memory layer 130 having a top surface 130T that isat a lower level than a top surface of each of the plurality of firstinsulating walls 116A and the plurality of second insulating walls 116B.Spaces defined by the plurality of first insulating walls 116A and theplurality of second insulating walls 116B may remain over the resistivememory layer 130.

Referring to FIG. 13K, the electrode layer 140 is formed on theresistive memory layer 130 and fills the spaces defined by the pluralityof first insulating walls 116A and the plurality of second insulatingwalls 116B.

To form the electrode layer 140, a conductive material required to formthe electrode layer 140 is deposited to a thickness enough to fill thespaces defined by the plurality of first insulating walls 116A and theplurality of second insulating walls 116B, followed by planarizing anobtained result product, thereby exposing the top surface of each of theplurality of first insulating walls 116A and the plurality of secondinsulating walls 116B.

Referring to FIG. 13L, a preliminary first interfacial layer 152L, apreliminary selection device layer 154L, a preliminary secondinterfacial layer 156L, and a preliminary electrode layer 160L areformed, in this stated order, on the result product in which theelectrode layer 140 is formed.

Referring to FIG. 13M, the plurality of stacked structures, in which thefirst interfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order, are formed by patterning the preliminary first interfaciallayer 152L, the preliminary selection device layer 154L, the preliminarysecond interfacial layer 156L, and the preliminary electrode layer 160L,and then, the insulating film 162 is formed and fills spaces between theplurality of stacked structures. The plurality of stacked structures maybe respectively arranged one by one, on a plurality of electrode layers140, at positions corresponding to the plurality of memory cells MC (seeFIG. 2), and thus may be arranged in a matrix form in a plan view.

Referring to FIG. 13N, the plurality of second conductive lines 170 andthe plurality of second insulating patterns 172 are formed on the resultproduct of FIG. 13M, thereby forming the memory device 100.

According to the method of fabricating the memory device 100, which hasbeen described with reference to FIGS. 13A to 13N, to minimize powerconsumption by reducing reset current in the memory device 100, informing the heating electrode layer 120 to an extremely small thicknessand forming the wedge memory portion 130W (see FIG. 3E) of the resistivememory layer 130 contacting the heating electrode layer 120 with aminimum contact area, since the widths of the spaces reaching the topsurface of the heating electrode layer 120 are increased due to theinclined sidewalls 122S, a deposition process for forming the wedgememory portion 130W of the resistive memory layer 130 in the spacesdefined by the plurality of first insulating walls 116A and theplurality of second insulating walls 116B may be stably and easilyperformed. Therefore, in the memory cell MC of the memory device 100highly micronized due to high integration and down-scaling, a structure,in which the heating electrode layer 120 having an extremely smallthickness contacts the wedge memory portion 130W (see FIG. 3E) of theresistive memory layer 130, is easily realized, whereby the memorydevice 100 configured to minimizing power consumption may be easilyfabricated. As shown in at least FIG. 13N, the width of the wedge memoryportion 130W is at least partially defined by the inclined sidewall 122Scontacting the wedge memory portion 130W.

Heretofore, although the method of fabricating the memory device 100shown in FIGS. 3A to 3E has been described with reference to FIGS. 13Ato 13N, the memory devices 100A, 200, 200A, 300, 400, 500, 600, 700, and800 shown in FIGS. 4 to 12B or memory devices having various structuresmodified and changed therefrom may be fabricated by using the processesdescribed with reference to FIGS. 13A to 13N or using various methodsmodified and changed therefrom without departing from the spirit andscope of the inventive concepts.

For example, to fabricate the memory device 100A shown in FIG. 4, theplurality of first conductive lines 110 and the plurality of firstinsulating patterns 112 are formed in the same manner as described withreference to FIG. 13A, followed by performing the processes describedwith reference to FIGS. 13L and 13M, whereby the plurality of stackedstructures, in which the first interfacial layer 152, the selectiondevice layer 154, the second interfacial layer 156, and the electrodelayer 160 are stacked in this stated order, and the insulating film 162filling the spaces between the plurality of stacked structures may beformed directly on the plurality of first conductive lines 110. Next,the processes described with reference to FIGS. 13B to 13K areperformed, whereby a structure including the heating electrode layer120, the resistive memory layer 130, and the electrode layer 140, whichare stacked in this stated order, may be formed, on the plurality ofstacked structures, in the spaces defined by the plurality of firstinsulating walls 116A and the plurality of second insulating walls 116B.Next, the plurality of second conductive lines 170 directly connected tothe plurality of electrode layers 140, and the plurality of secondinsulating patterns 172 insulating the plurality of second conductivelines 170 from each other may be formed in the same manner as describedwith reference to FIG. 13N.

FIGS. 14A to 14F are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 200 shown in FIG. 5A will be described with reference to FIGS.14A to 14F. FIGS. 14A to 14F illustrate cross-sectional views of maincomponents, which correspond to a cross-section taken along the lineA-A′ of FIG. 3A, according to a process order.

Referring to FIG. 14A, the plurality of first conductive lines 110 andthe plurality of first insulating patterns 112 are formed on theinterlayer dielectric 104 on the substrate 102 in the same manner asdescribed with reference to FIG. 13A, followed by forming the pluralityof first insulating walls 216A on the plurality of first conductivelines 110 and the plurality of first insulating patterns 112 in asimilar manner to that described with reference to FIG. 13B. Theplurality of first insulating walls 216A have substantially the sameconfiguration as the plurality of first insulating walls 116A shown inFIG. 13B except that the plurality of first insulating walls 216A havethe inclined sidewalls SW. The plurality of first insulating walls 216Ahaving the inclined sidewalls SW may each have an increasing width inthe X direction with decreasing distance from the substrate 102.

Referring to FIG. 14B, in a similar manner to that described withreference to FIGS. 13C to 13F, the preliminary heating electrode layer220L, the first insulating spacer layer 122L, and the gap-fillinsulating film 124 are formed in the spaces between the plurality offirst insulating walls 216A. The preliminary heating electrode layer220L may have substantially the same configuration as the preliminaryheating electrode layer 120L shown in FIG. 13F except that thepreliminary heating electrode layer 220L include: the base portion 220B;and the inclined fin portions 220P extending from both ends of the baseportion 220B in a direction away from the substrate 102 along theinclined sidewalls SW.

Referring to FIG. 14C, in a similar manner to that described withreference to FIG. 13G, the first etching process, in which the upperportion of the first insulating spacer layer 122L of the result productof FIG. 14B is selectively etched as much as a certain thickness, isperformed, thereby reducing the height of the first insulating spacerlayer 122L to form a lowered insulating spacer layer 122L as shown inFIG. 14C.

Referring to FIG. 14D, in a similar manner to that described withreference to FIG. 13H, the second etching process, in which an upperportion of the preliminary heating electrode layer 220L of the resultproduct of FIG. 14C is selectively etched, is performed, thereby formingthe heating electrode layer 220 having a top surface that is at a lowerlevel than the top surface of the first insulating spacer layer 122L.During the second etching process for forming the heating electrodelayer 220, a portion of the first insulating spacer layer 122L exposedto the etching atmosphere of the second etching process is removedtogether with the upper portion of the preliminary heating electrodelayer 220L, thereby forming the first insulating spacer 122 having theinclined sidewalls 122S from the first insulating spacer layer 122L.

Referring to FIG. 14E, in a similar manner to the method of forming theresistive memory layer 130 and the electrode layer 140, which has beendescribed with reference to FIGS. 13I to 13K, the resistive memory layer230 and the electrode layer 240 are formed on the heating electrodelayer 220.

Referring to FIG. 14F, in the same manner as described with reference toFIGS. 13L and 13M, the plurality of stacked structures, in which thefirst interfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order, and the insulating film 162 filling the spaces between theplurality of stacked structures are formed. Next, in the same manner asdescribed with reference to FIG. 13N, the plurality of second conductivelines 170 and the plurality of second insulating patterns 172 areformed, thereby forming the memory device 200.

According to the method of fabricating the memory device 200, which hasbeen described with reference to FIGS. 14A to 14F, to minimize powerconsumption by reducing reset current in the memory device 200, informing the heating electrode layer 220 to an extremely small thicknessand forming the wedge memory portion 230W (see FIG. 5D) of the resistivememory layer 230 contacting the heating electrode layer 220 with aminimum contact area, since spaces reaching the top surface of theheating electrode layer 220 are gradually widened because of theinclined sidewalls 122S, a deposition process for forming the wedgememory portion 230W of the resistive memory layer 230 may be stably andeasily performed. Therefore, the memory device 200, which includes theheating electrode layer 220 having an extremely small thickness and thewedge memory portion 230W (see FIG. 5D) of the resistive memory layer230 so as to minimize the power consumption of the memory device 200,may be easily fabricated.

To fabricate the memory device 200A shown in FIG. 6, the methoddescribed with reference to FIGS. 14A to 14F may be used. However, inobtaining the result product of FIG. 14B, like in the process describedwith reference to FIG. 13E, the plurality of first insulating walls216A, the preliminary heating electrode layer 220L, the first insulatingspacer layer 122L, and the gap-fill insulating film 124, which fill thespaces between the plurality of first insulating walls 216A, may beetched by using the plurality of mask patterns M1 as an etch mask. Here,a plurality of stacked structures including the preliminary heatingelectrode layer 220L, the first insulating spacer layer 122L, and thegap-fill insulating film 124 may have inclined sidewalls, and therebyhave increasing widths in the Y direction with decreasing distance fromthe substrate 102. Next, similarly to the method of forming theplurality of second insulating walls 116B, which has been described withreference to FIG. 13F, the plurality of second insulating walls 216C(see FIG. 6) may be formed. The plurality of second insulating walls216C may have decreasing widths in the Y direction with decreasingdistance from the substrate 102. Next, the processes described withreference to FIGS. 14C to 14F may be performed.

FIGS. 15A to 15C are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 300 shown in FIG. 7A will be described with reference to FIGS.15A to 15C. FIGS. 15A to 15C illustrate cross-sectional views of maincomponents, which correspond to a cross-section taken along the lineA-A′ of FIG. 3A, according to a process order.

Referring to FIG. 15A, the heating electrode layer 220 having the topcontact surface 220T that is at a lower level than the top surface 122Tof the first insulating spacer layer 122L, and the first insulatingspacer 122 having the inclined sidewalls 122S are formed by performingthe processes described with reference to FIGS. 14A to 14D, followed byperforming a third etching process for selectively etching an exposedsurface of each of the gap-fill insulating film 124, the plurality offirst insulating walls 216A, and the plurality of second insulatingwalls 216B (see FIG. 7A), thereby increasing the widths of the spacesover the heating electrode layer 220 in the X direction and the Ydirection, the spaces being defined by the gap-fill insulating film 124,the plurality of first insulating walls 216A, and the plurality ofsecond insulating walls 216B.

In FIG. 15A, shapes of the plurality of first insulating walls 216A andthe gap-fill insulating film 124 before the third etching process aremarked by dashed lines. After the third etching process, the upperportion of each of the plurality of first insulating walls 216A and theplurality of second insulating walls 216B may have the inclined sidewall216S. In addition, the upper portion of the gap-fill insulating film 124may have the inclined sidewall 124S. Thus, the inclined sidewalls 216S,124S may be formed after the forming of the first insulating spacer 122,and before the forming of the resistive memory layer 130, based onperforming the third etching process in which exposed surfaces of thefirst insulating walls 216A, the second insulating walls 216B, and thegap-fill insulating film 124 are etched.

The third etching process may be performed by using a difference betweenetch selectivities of the heating electrode layer 220 and the firstinsulating spacer 122 and etch selectivities of the gap-fill insulatingfilm 124, the plurality of first insulating walls 216A, and theplurality of second insulating walls 216B. For example, in the case thatthe heating electrode layer 220 includes TiN, that the first insulatingspacer 122 includes a silicon oxide film, and that the gap-fillinsulating film 124, the plurality of first insulating walls 216A, andthe plurality of second insulating walls 216B include a silicon nitridefilm, the third etching process may include a dry etching process usingcarbon fluoride, for example, CF₄ gas. The dry etching process mayinclude a process such as inductively coupled plasma (ICP) etching,transformer coupled plasma (TCP) etching, electron cyclotron resonance(ECR) plasma etching, reactive ion etching (RIE), or the like.

Referring to FIG. 15B, in a similar manner to the methods of forming theresistive memory layer 130 and the electrode layer 140, which have beendescribed with reference to FIGS. 13I to 13K, the resistive memory layer330 and the electrode layer 340 are formed on the heating electrodelayer 220. Each of the resistive memory layer 330 and the electrodelayer 340 may have increasing widths in the X direction and the Ydirection with increasing distance from the substrate 102.

Referring to FIG. 15C, in the same manner as described with reference toFIGS. 13L and 13M, the plurality of stacked structures, in which thefirst interfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order, and the insulating film 162 filling the spaces between theplurality of stacked structures are formed. Next, in the same manner asdescribed with reference to FIG. 13N, the plurality of second conductivelines 170 and the plurality of second insulating patterns 172 areformed, thereby forming the memory device 300.

According to the method of fabricating the memory device 300, which hasbeen described with reference to FIGS. 15A to 15C, to minimize powerconsumption by reducing reset current in the memory device 300, informing the heating electrode layer 220 to an extremely small thicknessand forming the wedge memory portion 330W (see FIG. 7C) of the resistivememory layer 330 contacting the heating electrode layer 220 with aminimum contact area, since relatively narrow spaces reaching the topsurface of the heating electrode layer 220 are gradually widened becauseof the inclined sidewalls 122S, a deposition process for forming thewedge memory portion 330W of the resistive memory layer 330 may bestably and easily performed. In addition, deposition processes forforming the resistive memory layer 330 and the electrode layer 340 maybe stably and easily performed due to the inclined sidewall 216S of theupper portion of each of the plurality of first insulating walls 216Aand the plurality of second insulating walls 216B and the inclinedsidewall 124S of the upper portion of the gap-fill insulating film 124.Therefore, the memory device 300 having a structure configured tominimizing power consumption and improving reliability may be easilyfabricated.

FIGS. 16A to 16F are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 400 shown in FIG. 8A will be described with reference to FIGS.16A to 16F. FIGS. 16A to 16F illustrate cross-sectional views of maincomponents, which correspond to a cross-section taken along the lineA-A′ of FIG. 3A, according to a process order.

Referring to FIG. 16A, in the same manner as described with reference toFIG. 14A, the plurality of first conductive lines 110 and the pluralityof first insulating patterns 112 are formed on the interlayer dielectric104 on the substrate 102, followed by forming the plurality of firstinsulating walls 216A. Next, the preliminary heating electrode layer120L and the first insulating spacer layer 122L are formed andconformally cover exposed surfaces of the plurality of first insulatingwalls 216A and the plurality of first conductive lines 110.

Referring to FIG. 16B, the first insulating spacer layer 122L of theresult product of FIG. 16A undergoes etch-back, thereby forming theseparated insulating spacer 122SP, which exposes a portion of thepreliminary heating electrode layer 120L in the spaces between theplurality of first insulating walls 216A.

Referring to FIG. 16C, the exposed portion of the preliminary heatingelectrode layer 120L is etched by using the separated insulating spacer122SP and the plurality of first insulating walls 216A as an etch mask,thereby leaving a pair of separated preliminary heating electrode layers220R in each of the spaces between the plurality of first insulatingwalls 216A and exposing the first conductive line 110 between the pairof separated preliminary heating electrode layers 220R.

Referring to FIG. 16D, the preliminary gap-fill insulating film 124L isformed to fill the spaces between the plurality of first insulatingwalls 216A.

Referring to FIG. 16E, similar processes to those described withreference to FIGS. 13D to 13F are performed, thereby leaving the pair ofseparated preliminary heating electrode layers 220R, a pair of separatedinsulating spacers 122SP, and the gap-fill insulating film 124 in eachof the spaces between the plurality of first insulating walls 216A.

Referring to FIG. 16F, in a similar manner to that described withreference to FIG. 13G, there is performed the first etching process, inwhich heights of the pair of separated insulating spacers 122SP arereduced by selectively etching upper portions of the pair of separatedinsulating spacers 122SP of the result product of FIG. 16E as much as acertain thickness. Next, in a similar manner to that described withreference to FIG. 13H, there is performed the second etching process, inwhich the inclined sidewalls 122S are formed in the pair of separatedinsulating spacers 122SP by removing portions of the pair of separatedinsulating spacers 122SP while the heating electrode layer 220 includingthe pair of separated heating electrode layers 220R1 and 220R2 is formedby selectively etching the upper portions of the pair of separatedinsulating spacers 122SP, the pair of separated heating electrode layers220R1 and 220R2 having top surfaces that are at a lower level than topsurfaces of the pair of separated insulating spacers 122SP.

Next, in the same manner as described with reference to FIGS. 13I to13M, the resistive memory layer 230 and the electrode layer 240 areformed on the heating electrode layer 220, followed by forming theplurality of stacked structures, in which the first interfacial layer152, the selection device layer 154, the second interfacial layer 156,and the electrode layer 160 are stacked in this stated order, and theinsulating film 162 filling the spaces between the plurality of stackedstructures. Next, in the same manner as described with reference to FIG.13N, the plurality of second conductive lines 170 and the plurality ofsecond insulating patterns 172 are formed, thereby forming the memorydevice 400.

According to the method of fabricating the memory device 400, which hasbeen described with reference to FIGS. 16A to 16F, the process offorming the resistive memory layer 230 including the wedge memoryportion 230W (see FIG. 8B), which contacts the heating electrode layer220 having an extremely small thickness, is stably and easily performed,whereby the memory device 400 configured to minimize power consumptionby reducing reset current may be easily fabricated.

FIGS. 17A to 17G are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 500 shown in FIG. 9A will be described with reference to FIGS.17A to 17G. FIGS. 17A to 17G illustrate cross-sectional views of maincomponents, which correspond to a cross-section taken along the lineA-A′ of FIG. 3A, according to a process order.

Referring to FIG. 17A, in the same manner as described with reference toFIG. 14A, the plurality of first conductive lines 110 and the pluralityof first insulating patterns 112 are formed on the interlayer dielectric104 on the substrate 102, followed by forming the plurality of firstinsulating walls 216A on the plurality of first conductive lines 110 andthe plurality of first insulating patterns 112.

The first insulating spacer 512 is formed to cover the inclinedsidewalls SW of the plurality of first insulating walls 216A, followedby forming a preliminary heating electrode layer 520L, which conformallycovers exposed surfaces of the plurality of first insulating walls 216A,the plurality of first conductive lines 110, and the first insulatingspacer 512. Next, the preliminary gap-fill insulating film 124L isformed on the preliminary heating electrode layer 520L and fills thespaces between the plurality of first insulating walls 216A.

The first insulating spacer 512 may include a different material fromthe plurality of first insulating walls 216A and the preliminarygap-fill insulating film 124L. In some example embodiments, the firstinsulating spacer 512 may include a silicon oxide film, and theplurality of first insulating walls 216A and the preliminary gap-fillinsulating film 124L may include a silicon nitride film.

Referring to FIG. 17B, similar processes to those described withreference to FIGS. 13D to 13F are performed, thereby forming a structurein which the first insulating spacer 512, the preliminary heatingelectrode layer 520L, and the gap-fill insulating film 124 fill thespaces between the plurality of first insulating walls 216A.

Referring to FIG. 17C, in a similar manner to that described withreference to FIG. 13G, the first etching process, in which an upperportion of the first insulating spacer 512 of the result product of FIG.17B is selectively etched as much as a certain thickness, is performed,thereby reducing the height of the first insulating spacer 512.

Referring to FIG. 17D, in a similar manner to that described withreference to FIG. 13H, the second etching process, in which an upperportion of the preliminary heating electrode layer 520L of the resultproduct of FIG. 17C is selectively etched, is performed, thereby formingthe heating electrode layer 520 having a top surface that is at a lowerlevel than the top surface of the first insulating spacer 512. Duringthe second etching process, a portion of the first insulating spacer 512exposed to the etching atmosphere of the second etching process isremoved together with the upper portion of the preliminary heatingelectrode layer 520L, thereby forming an inclined sidewall 512S in thefirst insulating spacer 512.

Referring to FIG. 17E, in a similar manner to that described withreference to FIG. 15A, the third etching process for selectively etchingthe exposed surface of each of the gap-fill insulating film 124, theplurality of first insulating walls 216A, and the plurality of secondinsulating walls 216B (see FIG. 9A) is performed, thereby increasingwidths of spaces over the heating electrode layer 520 in the X directionand the Y direction, the spaces being defined by the gap-fill insulatingfilm 124, the plurality of first insulating walls 216A, and theplurality of second insulating walls 216B. After the third etchingprocess, the upper portion of each of the plurality of first insulatingwalls 216A and the plurality of second insulating walls 216B may havethe inclined sidewall 216S. In addition, the upper portion of thegap-fill insulating film 124 may have the inclined sidewall 124S.

Referring to FIG. 17F, in a similar manner to the method of forming theresistive memory layer 130 and the electrode layer 140, which has beendescribed with reference to FIGS. 13I to 13K, the resistive memory layer530 and the electrode layer 540 are formed on the heating electrodelayer 520. Each of the resistive memory layer 530 and the electrodelayer 540 may have increasing widths in the X direction and the Ydirection with increasing distance from the substrate 102.

Referring to FIG. 17G, in the same manner as described with reference toFIGS. 13L and 13M, the plurality of stacked structures, in which thefirst interfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order, and the insulating film 162 filling the spaces between theplurality of stacked structures are formed. Next, in the same manner asdescribed with reference to FIG. 13N, the plurality of second conductivelines 170 and the plurality of second insulating patterns 172 areformed, thereby forming the memory device 500.

According to the method of fabricating the memory device 500, which hasbeen described with reference to FIGS. 17A to 17G, to minimize powerconsumption by reducing reset current in the memory device 500, informing the heating electrode layer 520 to an extremely small thicknessand forming the wedge memory portion 530W (see FIG. 9B) of the resistivememory layer 530 contacting the heating electrode layer 520 with aminimum contact area, since relatively narrow spaces reaching the topsurface of the heating electrode layer 520 are gradually widened becauseof the inclined sidewall 512S, a deposition process for forming thewedge memory portion 530W may be stably and easily performed. Inaddition, deposition processes for forming the resistive memory layer530 and the electrode layer 540 may be stably and easily performed dueto the inclined sidewall 216S of the upper portion of each of theplurality of first insulating walls 216A and the plurality of secondinsulating walls 216B and the inclined sidewall 124S of the upperportion of the gap-fill insulating film 124. Therefore, the memorydevice 500 having a structure configured to minimizing power consumptionand improving reliability may be easily fabricated.

FIGS. 18A to 18G are cross-sectional views illustrating sequentialprocesses of an example method of fabricating a memory device, accordingto some example embodiments. An example method of fabricating the memorydevice 600 shown in FIG. 10A will be described with reference to FIGS.18A to 18G. FIGS. 18A to 18G illustrate cross-sectional views of maincomponents, which correspond to a cross-section taken along the lineA-A′ of FIG. 3A, according to a process order.

Referring to FIG. 18A, in the same manner as described with reference toFIG. 14A, the plurality of first conductive lines 110 and the pluralityof first insulating patterns 112 are formed on the interlayer dielectric104 on the substrate 102, followed by forming the plurality of firstinsulating walls 216A on the plurality of first conductive lines 110 andthe plurality of first insulating patterns 112.

The first insulating spacer 612 is formed to cover the inclinedsidewalls SW of the plurality of first insulating walls 216A, followedby forming a preliminary heating electrode layer 620L, which conformallycovers exposed surfaces of the plurality of first insulating walls 216A,the plurality of first conductive lines 110, and the first insulatingspacer 612. Next, a second insulating spacer layer 614L is formed toconformally cover the preliminary heating electrode layer 620L, and thepreliminary gap-fill insulating film 124L is formed on the secondinsulating spacer layer 614L and fills the spaces between the pluralityof first insulating walls 216A.

The first insulating spacer 612 and the second insulating spacer layer614L may include different materials from the plurality of firstinsulating walls 216A and the preliminary gap-fill insulating film 124L.In some example embodiments, the first insulating spacer 612 and thesecond insulating spacer layer 614L may include a silicon oxide film,and the plurality of first insulating walls 216A and the preliminarygap-fill insulating film 124L may include a silicon nitride film.

Referring to FIG. 18B, similar processes to those described withreference to FIGS. 13D to 13F are performed, thereby forming a structurein which the first insulating spacer 612, the preliminary heatingelectrode layer 620L, the second insulating spacer 614 corresponding toa remaining portion of the second insulating spacer layer 614L, and thegap-fill insulating film 124 fill the spaces between the plurality offirst insulating walls 216A.

Referring to FIG. 18C, in a similar manner to that described withreference to FIG. 13G, the first etching process, in which an upperportion of each of the first insulating spacer 612 and the secondinsulating spacer 614 of the result product of FIG. 18B is selectivelyetched as much as a certain thickness, is performed, thereby reducingheights of the first insulating spacer 612 and the second insulatingspacer 614.

Referring to FIG. 18D, in a similar manner to that described withreference to FIG. 13H, the second etching process, in which an upperportion of the preliminary heating electrode layer 620L of the resultproduct of FIG. 18C is selectively etched, is performed, thereby formingthe heating electrode layer 620 having a top surface that is at a lowerlevel than top surfaces of the first insulating spacer 612 and thesecond insulating spacer 614. During the second etching process,portions of the first insulating spacer 612 and the second insulatingspacer 614 exposed to the etching atmosphere of the second etchingprocess are removed together with the upper portion of the preliminaryheating electrode layer 620L, thereby respectively forming inclinedsidewalls 612S and 614S in the first insulating spacer 612 and thesecond insulating spacer 614.

Referring to FIG. 18E, in a similar manner to that described withreference to FIG. 15A, the third etching process for selectively etchingthe exposed surface of each of the gap-fill insulating film 124, theplurality of first insulating walls 216A, and the plurality of secondinsulating walls 216B (see FIG. 10A) is performed, thereby increasingwidths of spaces over the heating electrode layer 620 in the X directionand the Y direction, the spaces being defined by the gap-fill insulatingfilm 124, the plurality of first insulating walls 216A, and theplurality of second insulating walls 216B. After the third etchingprocess, the upper portion of each of the plurality of first insulatingwalls 216A and the plurality of second insulating walls 216B may havethe inclined sidewall 216S. In addition, the upper portion of thegap-fill insulating film 124 may have the inclined sidewall 124S.

Referring to FIG. 18F, in a similar manner to the method of forming theresistive memory layer 130 and the electrode layer 140, which has beendescribed with reference to FIGS. 13I to 13K, the resistive memory layer630 and the electrode layer 640 are formed on the heating electrodelayer 620. Each of the resistive memory layer 630 and the electrodelayer 640 may have increasing widths in the X direction and the Ydirection with increasing distance from the substrate 102.

Referring to FIG. 18G, in the same manner as described with reference toFIGS. 13L and 13M, the plurality of stacked structures, in which thefirst interfacial layer 152, the selection device layer 154, the secondinterfacial layer 156, and the electrode layer 160 are stacked in thisstated order, and the insulating film 162 filling the spaces between theplurality of stacked structures are formed. Next, in the same manner asdescribed with reference to FIG. 13N, the plurality of second conductivelines 170 and the plurality of second insulating patterns 172 areformed, thereby forming the memory device 600.

According to the method of fabricating the memory device 600, which hasbeen described with reference to FIGS. 18A to 18G, to minimize powerconsumption by reducing reset current in the memory device 600, informing the heating electrode layer 620 to an extremely small thicknessand forming the wedge memory portion 630W (see FIG. 10B) of theresistive memory layer 630 contacting the heating electrode layer 620with a minimum contact area, since relatively narrow spaces reaching thetop surface of the heating electrode layer 620 are gradually widenedbecause of the inclined sidewalls 612S and 614S, a deposition processfor forming the wedge memory portion 630W may be easily performed. Inaddition, deposition processes for forming the resistive memory layer630 and the electrode layer 640 may be easily performed due to theinclined sidewall 216S of the upper portion of each of the plurality offirst insulating walls 216A and the plurality of second insulating walls216B (see FIG. 10A) and the inclined sidewall 124S of the upper portionof the gap-fill insulating film 124. Therefore, the memory device 600having a structure configured to minimizing power consumption andimproving reliability may be easily fabricated.

While the inventive concepts have been particularly shown and describedwith reference to embodiments thereof, it will be understood thatvarious changes in form and details may be made therein withoutdeparting from the spirit and scope of the following claims.

What is claimed is:
 1. A method of fabricating a memory device, themethod comprising: forming a first conductive line extending over asubstrate in a first direction; forming a memory cell pillar on thefirst conductive line, wherein the memory cell pillar includes a heatingelectrode layer and a resistive memory layer, the resistive memory layerincluding a wedge memory portion and a body memory portion, the wedgememory portion contacting the heating electrode layer and having a widththat changes with increasing distance from the heating electrode layer,the body memory portion being connected to the wedge memory portion; andforming a second conductive line extending over the memory cell pillarin a second direction that intersects the first direction, such that thefirst conductive line and the second conductive line vertically overlapwith the memory cell pillar interposed between the first conductive lineand the second conductive line.
 2. The method according to claim 1,wherein the forming of the memory cell pillar comprises: forming a pairof insulating walls over the first conductive line, the pair ofinsulating walls being spaced apart from each other with a filling spacetherebetween, forming the heating electrode layer in the filling space,such that the heating electrode layer conformally covers the pair ofinsulating walls and the first conductive line, and forming theresistive memory layer in the filling space, such that the wedge memoryportion contacts the heating electrode layer and having a width thatincreases continuously with increasing distance from the heatingelectrode layer, and the body memory portion has a greater width thanthe wedge memory portion.
 3. The method according to claim 2, furthercomprising: forming an electrode layer on the resistive memory layer inthe filling space.
 4. The method according to claim 1, wherein theforming of the memory cell pillar comprises: forming a pair ofinsulating walls over the first conductive line, the pair of insulatingwalls being spaced apart from each other with a filling spacetherebetween, forming the heating electrode layer, an insulating spacer,and a gap-fill insulating film sequentially covering the firstconductive line in the filling space, such that the heating electrodelayer conformally covers the pair of insulating walls and the firstconductive line, and the insulating spacer has inclined sidewallsdefining partial spaces exposing the heating electrode layer, andforming the resistive memory layer on the heating electrode layer and onthe insulating spacer, such that the wedge memory portion of theresistive memory layer fills the partial spaces.
 5. The method accordingto claim 4, wherein the forming of the memory cell pillar comprises:forming an inclined sidewall in each of the pair of insulating walls andthe gap-fill insulating film before the forming of the resistive memorylayer, wherein the body memory portion of the resistive memory layer hasincreasing widths with increasing distance from the substrate.
 6. Themethod according to claim 1, wherein, in the forming of the memory cellpillar, the body memory portion is formed to have a greater width thanthe wedge memory portion.
 7. The method according to claim 1, wherein,in the forming of the memory cell pillar, the heating electrode layer isformed to have a base portion extending substantially parallel to thefirst conductive line, and a fin portion extending from one end of thebase portion in a direction away from the first conductive line, and thewedge memory portion of the resistive memory layer contacts the finportion of the heating electrode layer.
 8. The method according to claim1, the forming of the memory cell pillar further comprising: forming anelectrode layer on the resistive memory layer, wherein the heatingelectrode layer, the resistive memory layer, and the electrode layer arealigned with a line extending between the first conductive line and thesecond conductive line.
 9. The method according to claim 1, wherein, inthe forming of the memory cell pillar, the heating electrode layer isformed to have a base portion extending substantially parallel to thefirst conductive line, and a fin portion extending from one end of thebase portion in a direction away from the first conductive line, andwherein an included angle between the base portion and the fin portionis a right angle or an obtuse angle.
 10. The method according to claim1, wherein, in the forming of the memory cell pillar, the heatingelectrode layer and the resistive memory layer vertically overlap eachother along an axis extending between the first conductive line and thesecond conductive line.
 11. A method of fabricating a memory device, themethod comprising: forming a first conductive line over a substrate;forming a pair of insulating walls over the first conductive line, thepair of insulating walls being spaced apart from each other with afilling space therebetween; forming a preliminary heating electrodelayer, an insulating spacer layer, and a gap-fill insulating film in thefilling space, such that the preliminary heating electrode layerconformally covers the pair of insulating walls and the first conductiveline, and the insulating spacer layer and the gap-fill insulating filmsequentially cover the preliminary heating electrode layer; forming alowered insulating spacer layer based on performing a first etchingprocess in which an upper portion of the insulating spacer layer in thefilling space is selectively etched as much as a certain thickness;forming a heating electrode layer and an insulating spacer in thefilling space based on performing a second etching process in which aportion of the lowered insulating spacer layer is removed while an upperportion of the preliminary heating electrode layer is selectivelyetched, wherein the heating electrode layer has a top surface that is ata lower level than a top surface of the lowered insulating spacer layer,and the insulating spacer has an inclined sidewall; and forming aresistive memory layer in a region at least partially defined by theheating electrode layer, the inclined sidewall of the insulating spacer,the pair of insulating walls, and the gap-fill insulating film in thefilling space.
 12. The method according to claim 11, wherein, in theforming of the heating electrode layer, the heating electrode layerincludes a base portion extending substantially parallel to the firstconductive line, and a fin portion extending from one end of the baseportion in a direction away from the first conductive line, and afterthe second etching process, a surface that is distal in the fin portionfrom the first conductive line is exposed by a space at least partiallydefined by the inclined sidewall in the filling space.
 13. The methodaccording to claim 11, wherein, in the forming of the heating electrodelayer, the heating electrode layer includes a fin portion extending in adirection away from the first conductive line, and in the forming of theresistive memory layer, the resistive memory layer includes a wedgememory portion contacting the fin portion and having a width defined bythe inclined sidewall.
 14. The method according to claim 11, wherein, inthe forming of the resistive memory layer, the resistive memory layerincludes a wedge memory portion contacting a fin portion of the heatingelectrode layer and having a width defined by the inclined sidewall, anda body memory portion having a greater width than the wedge memoryportion.
 15. The method according to claim 11, further comprising:forming an inclined sidewall in each of the pair of insulating walls andthe gap-fill insulating film after the forming of the insulating spacer,and before the forming of the resistive memory layer, based onperforming a third etching process in which exposed surfaces of the pairof insulating walls and the gap-fill insulating film are etched.
 16. Themethod according to claim 11, after the forming of the resistive memorylayer, further comprising: forming an electrode layer on the resistivememory layer in the filling space.
 17. A method of fabricating a memorydevice, the method comprising: forming a first conductive line extendingover a substrate in a first direction; forming a memory cell pillar onthe first conductive line; and forming a second conductive lineextending over the memory cell pillar in a second direction thatintersects the first direction, such that the first conductive line andthe second conductive line vertically overlap with the memory cellpillar between the first conductive line and the second conductive line,wherein the forming of the memory cell pillar comprises forming aninsulating wall over the first conductive line, forming a heatingelectrode layer on the first conductive line, the heating electrodelayer including a base portion extending substantially parallel to thefirst conductive line, and a fin portion extending along a sidewall ofthe insulating wall from one end of the base portion in a direction awayfrom the first conductive line, forming a gap-fill insulating film onthe heating electrode layer, and forming a resistive memory layer on thefin portion of the heating electrode layer, the resistive memory layerincluding a wedge memory portion and a body memory portion located in aspace between the insulating wall and the gap-fill insulating film, thewedge memory portion contacting the fin portion of the heating electrodelayer and having an inclined sidewall such that the wedge memory portionhas a width that increases continuously with increasing distance fromthe heating electrode layer, the body memory portion being connected tothe wedge memory portion.
 18. The method according to claim 17, furthercomprising: forming an insulating spacer covering a sidewall of theinsulating wall before the forming of the heating electrode layer,wherein a height of the insulating spacer is smaller than a height ofthe insulating wall, and wherein the insulating spacer includes adifferent material from the insulating wall and the gap-fill insulatingfilm.
 19. The method according to claim 17, further comprising: formingan insulating spacer on the heating electrode layer before the formingof the gap-fill insulating film, wherein the gap-fill insulating film isformed on the insulating spacer, the insulating spacer being interposedbetween the heating electrode layer and the gap-fill insulating film,wherein a height of the insulating spacer is smaller than a height ofthe insulating wall, and wherein the insulating spacer includes adifferent material from the insulating wall and the gap-fill insulatingfilm.
 20. The method according to claim 17, further comprising: formingan insulating spacer on the heating electrode layer before the formingof the gap-fill insulating film, wherein, in the forming of theresistive memory layer, the resistive memory layer is formed such thatthe body memory portion covers a top surface of the insulating spacer.